Spin coater

Spin coater

Description

The Laurell WS-650-Mz-23NPP spin coater is a desktop system to make accurate and uniform defect-free thin films on substrates and wafers. The system includes precision dispenser and spinner.

Capacities

  • Rotation: up to 12,000 rpm
  • Substrate size: up to 150 mm (6″) for the round wafers and up to 127 mm x 127 mm (5″x5″) square substrate, pieces of the wafer of irregular shape.

Applications

The system performs spin coating of wide range of material such as photoresist, photosensitive dielectric, spin-on material (SU8, PI, silicone, etc.) and variety of aqueous solution.
Typical thickness of the thin films is 0.2 to 10 μm.

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Last update on July 20, 2015